4968

4672

كارشناسي ارشد

ساخت و توليد

اصفهان: دانشگاه صنعتي اصفهان، دانشكده مكانيك

1388

يازده، 99ص: مصور،جدول، نمودار، عكس

ص.ع. به: فارسي و انگليسي

عليرضا فدايي تهراني، جواد زركوب

30/10/88

محسن صفوي، محمد رضا فروزان

مهندسي مكانيك

ID4672

به فارسي و انگليسي: قابل رويت در نسخه ديجيتال

A New Approach in Micro Nano Photochemical Machining Omitting Photomask Pattern Nima Nouri Ninouri2003@yahoo com Date Department College of mechanical engineering Isfahan University of Technology Ifahan 84156 83111 IranDegree M Sc Language FarsiSuperviser name and emailAbstract The photochemical machining is the process of metal removal in which light and photosensitive mask are used to select the intended areas and to apply machining To develop thetransistors and integrated circuits IC and parts in Micro Nano dimensions precision chemicalmachining technology is used Photo mask pattern in chemical machining method and negativefilm in photochemical machining method are used for projecting an object image on the workpiece surface These two methods are expensive as they require extra cost to develop photo maskpattern and negative film for each work piece To overcome these problems and to reduce thecost a new method is presented in which the image is projected on the work piece without usinga photo mask pattern or a negative film In this optic system ultra violet UV light is producedand projected and after paralleling by polarized lenses the light is passing through a particularcomputerized image processed plate Therefore the imaged UV light is projected on the workpiece surface after passing special optical lenses This particular optic system is connected to acomputer through which the displayed image on the computer monitor is transferred to the opticsystem Finally high patterning resolution around 4 micrometers is obtained by using this opticsystem as a photomask KeywordsPhotochemical Machining Micro Nano machining photo mask optic system

عليرضا فدايي تهراني، جواد زركوب

محسن صفوي، محمد رضا فروزان